Solid-source doping of a-Si:H thin films deposited with a remote hydrogen plasma

被引:0
|
作者
机构
[1] Johnson, N.M.
[2] Street, R.A.
[3] Walker, J.
[4] Winer, K.
来源
Johnson, N.M. | 1600年 / 114期
关键词
Gaseous Hydrides - Hydrogenated Amorphous Silicon Thin Films - Remote Hydrogen Plasma;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] DEPOSITION OF A-SI-H FILMS WITH A REMOTE HYDROGEN PLASMA
    JOHNSON, NM
    WALKER, J
    DOLAND, CM
    WINER, K
    STREET, RA
    AMORPHOUS SILICON TECHNOLOGY - 1989, 1989, 149 : 39 - 43
  • [22] Crystal perfection of GaP films grown on Si substrates by solid-source MBE with atomic hydrogen
    M. A. Putuato
    Yu. B. Bolkhovityanov
    A. P. Vasilenko
    A. K. Gutakovskii
    Semiconductors, 2009, 43 : 1235 - 1239
  • [23] Surface passivation of crystalline silicon by intrinsic a-Si:H films deposited in remote low frequency inductively coupled plasma
    Guo, Yingnan
    Ong, Thiam Min Brian
    Xu, Shuyan
    APPLIED SURFACE SCIENCE, 2019, 487 : 146 - 150
  • [24] Hydrogen in a-Si:H deposited by 55 kHz PECVD
    Budaguan, BG
    Aivazov, AA
    HYDROGEN IN SEMICONDUCTORS AND METALS, 1998, 513 : 387 - 392
  • [25] Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films
    Muellerova, Jarmila
    Fischer, Marinus
    Netrvalova, Marie
    Zeman, Miro
    Sutta, Pavel
    CENTRAL EUROPEAN JOURNAL OF PHYSICS, 2011, 9 (05): : 1301 - 1308
  • [26] Effect of substrate on hydrogen in and out diffusion from a-Si:H thin films
    R. Rao
    F. Kail
    P. Roca i Cabarrocas
    Journal of Materials Science: Materials in Electronics, 2007, 18 : 1051 - 1056
  • [27] Properties of a-Si:H films deposited from silane diluted with hydrogen and helium using modified pulse plasma technique
    Mukherjee, C
    Anandan, C
    Seth, T
    Dixit, PN
    Bhattacharyya, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (06): : 3202 - 3208
  • [28] LOCAL BONDING OF OXYGEN AND HYDROGEN IN A-SI=H=O THIN-FILMS
    LUCOVSKY, G
    POLLARD, WB
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 313 - 316
  • [29] Effect of substrate on hydrogen in and out diffusion from a-Si:H thin films
    Rao, R.
    Kail, F.
    Cabarrocas, P. Roca i
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2007, 18 (10) : 1051 - 1056
  • [30] Kinetic study of solid phase crystallisation of expanding thermal plasma deposited a-Si:H
    Law, F.
    Hoex, B.
    Wang, J.
    Luther, J.
    Sharma, K.
    Creatore, M.
    van de Sanden, M. C. M.
    THIN SOLID FILMS, 2012, 520 (17) : 5820 - 5825