Solid-source doping of a-Si:H thin films deposited with a remote hydrogen plasma

被引:0
|
作者
机构
[1] Johnson, N.M.
[2] Street, R.A.
[3] Walker, J.
[4] Winer, K.
来源
Johnson, N.M. | 1600年 / 114期
关键词
Gaseous Hydrides - Hydrogenated Amorphous Silicon Thin Films - Remote Hydrogen Plasma;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] SOLID-SOURCE DOPING OF A-SI-H THIN-FILMS DEPOSITED WITH A REMOTE HYDROGEN PLASMA
    JOHNSON, NM
    STREET, RA
    WALKER, J
    WINER, K
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1989, 114 : 169 - 171
  • [2] Influence of hydrogen dilution on surface roughness development of a-Si: H thin films grown by remote plasma deposition
    Wank, M. A.
    Illiberi, A.
    Tichelaar, F. D.
    van Swaaij, R. A. C. M. M.
    van de Sanden, M. C. M.
    Zeman, M.
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 7 NO 3-4, 2010, 7 (3-4): : 571 - 574
  • [3] INSITU OPTICAL CHARACTERIZATIONS FOR RF PLASMA DEPOSITED A-SI - H THIN-FILMS
    CANILLAS, A
    BERTRAN, E
    ANDUJAR, JL
    MORENZA, JL
    VACUUM, 1989, 39 (7-8) : 785 - 787
  • [4] a-Si:H Thin Films Deposited at Low Temperature by Sputtering
    Nunes, C. C. P.
    Zambom, L. S.
    Mansano, R. D.
    MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2010, 2010, 31 (01): : 135 - 142
  • [5] EFFECT OF PLASMA PARAMETERS ON THE PROPERTIES OF HYDROGEN IN a-Si:H FILMS AND RELEASE MECHANISM OF HYDROGEN IN a-Si:H FILMS.
    Wang Cheng
    He Kelun
    Cheng Ruguang
    Qi Mingwei
    Hongwai Yanjiu/Chinese Journal of Infrared Research, 1985, 4 (06): : 413 - 420
  • [6] Some issues on hydrogen and hydrogenation of plasma enhanced chemical vapor deposited films in a-Si:H thin-film transistors
    Kuo, Y
    VACUUM, 2000, 59 (2-3) : 484 - 491
  • [7] Crystallization of a-Si:H and a-SiC:H thin films deposited by PECVD
    Kim, YT
    Yoon, SG
    Kim, H
    Suh, SJ
    Jang, GE
    Yoon, DH
    JOURNAL OF CERAMIC PROCESSING RESEARCH, 2005, 6 (04): : 294 - 297
  • [8] EXPANDING THERMAL PLASMA DEPOSITED a-Si:H THIN FILMS FOR SURFACE PASSIVATION OF c-Si WAFERS
    Illiberi, A.
    Sharma, K.
    Creatore, M.
    Kessels, W. M. M.
    van de Sanden, M. C. M.
    35TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE, 2010, : 637 - 639
  • [9] Preparation and properties of a-Si:H thin films deposited on different substrates
    Rui Rao
    Journal of Wuhan University of Technology-Mater. Sci. Ed., 2007, 22 : 126 - 128
  • [10] Preparation and properties of a-Si:H thin films deposited on different substrates
    Rao Rui
    JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION, 2007, 22 (01): : 126 - 128