Nanostructure of near-surface Si layers formed by implantation and pulsed laser annealing
被引:0
作者:
Klinger, D.
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机构:
Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, PolandInstitute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland
Klinger, D.
[1
]
Auleytner, J.
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机构:
Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, PolandInstitute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland
Auleytner, J.
[1
]
Zymierska, D.
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机构:
Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, PolandInstitute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland
Zymierska, D.
[1
]
Nowicki, L.
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机构:
Soltan Institute for Nuclear Studies, ul. Hoza 69, PL-00-681 Warsaw, PolandInstitute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland
Nowicki, L.
[2
]
机构:
[1] Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland
[2] Soltan Institute for Nuclear Studies, ul. Hoza 69, PL-00-681 Warsaw, Poland
来源:
Journal of Alloys and Compounds
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2004年
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362卷
/
1-2期