Dual-mode plasma-enhanced chemical vapor deposition (PECVD) of polymer-like a-C:H films: vibrational and optical properties

被引：0
|
作者：
Ecole Polytechnique, Palaiseau, France [1 ]
机构：
来源：
Synth Met | / 1-3卷 / 191-194期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
10
引用
收藏
相关论文
共 50 条
  • [41] Effect of plasma-enhanced chemical vapor deposition (PECVD) graphene content on the properties of EPDM/graphene composites
    Su, Jun
    Li, Caihong
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2021, 32 (07) : 9065 - 9073
  • [42] Synthesis and mechanical properties of Ti-Si-C films by a plasma-enhanced chemical vapor deposition
    Han, DS
    Song, PK
    Cho, KM
    Park, YH
    Kim, KH
    SURFACE & COATINGS TECHNOLOGY, 2004, 188 : 446 - 451
  • [43] PHOTOCONDUCTIVITY AND OPTICAL STABILITY OF INTRINSIC MU-C-SI FILMS FORMED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION, REMOTE PECVD
    WILLIAMS, MJ
    WANG, C
    LUCOVSKY, G
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 : 737 - 740
  • [44] Downstream plasma-enhanced chemical vapor deposition of SiNx:H films from hexamethylcyclotrisilazane
    Smirnova, TP
    Yakovkina, LV
    Amosov, YI
    Danilovich, OV
    INORGANIC MATERIALS, 1996, 32 (06) : 615 - 619
  • [45] Stress in amorphous SiOx:H films prepared by plasma-enhanced chemical vapor deposition
    He, Le-Nian
    Inokuma, Takao
    Kurata, Yoshihiro
    Hasegawa, Seiich
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (03): : 1873 - 1879
  • [46] Stress in amorphous SiOx:H films prepared by plasma-enhanced chemical vapor deposition
    He, LN
    Inokuma, T
    Kurata, Y
    Hasegawa, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (03): : 1873 - 1879
  • [47] Chemical composition and properties of films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition
    V. R. Shayapov
    Yu. M. Rumyantsev
    P. E. Plyusnin
    High Energy Chemistry, 2016, 50 : 213 - 218
  • [48] Chemical composition and properties of films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition
    Shayapov, V. R.
    Rumyantsev, Yu. M.
    Plyusnin, P. E.
    HIGH ENERGY CHEMISTRY, 2016, 50 (03) : 213 - 218
  • [49] Organic polymer thin films deposited on silicon and copper by plasma-enhanced chemical vapor deposition method and characterization of their electrochemical and optical properties
    Bae, IS
    Cho, SH
    Park, ZT
    Kim, JG
    Boo, JH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (04): : 875 - 879
  • [50] PROPERTIES OF TITANIUM SILICIDE FILMS DEPOSITED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
    HEMMES, DG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (06): : 1332 - 1335
12345