New Bilayer Positive Photoresist for 193 nm Photolithography

被引：0
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作者：
Kim, Young-Dab
Park, Sang-Jin
Lee, Haiwon
Kim, Eung-Ryul
Choi, Sang-Jun
Lee, Si-Hyeung
机构：
[1] Department of Chemistry, Hanyang University, Seoul 133-791, Korea, Republic of
[2] Semiconductor R. and D. Center, Samsung Electronics, Nongseo-Ri Kiheung-Eup, Youngin-City, Kyungki-Do 449-900, Korea, Republic of
来源：
Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals | / 327卷
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页码：279 / 282
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