Oxidation of amorphous NiZr sputtered films

被引：0

作者：

Cochrane, R.W. ^{[1
]}

Huai, Y. ^{[1
]}

McManus, M.K. ^{[1
]}

Sacher, E. ^{[1
]}

机构：

[1] Univ de Montreal, Montreal, Canada

来源：

Materials Science and Engineering A | 1991年 / A134卷

关键词：

Glass; Metallic - Oxidation - Metallography - Sputtering - Surface Phenomena;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

In this study the surface oxidation of a number of nickel-rich NiZr alloys is reported as a means to determine its role on the stability of amorphous zirconium-based metallic glasses. The evolution of the oxide layer was monitored by following the nickel and zirconium XPS peaks after exposure to an oxygen pressure of 10-5 mbar for various periods. The surface of the air-exposed films is characterized as ZrO2 even for bulk nickel concentrations over 80 at.%. After sputter cleaning, oxidation at room temperature under controlled oxygen exposure results in a several-stage oxidation towards ZrO2 accompanied by a systematic depletion of the nickel at the surface. This reaction saturates after exposures of the order of several thousand Langmuirs. Throughout this process, nickel remains primarily in a metallic state. There is, moreover, indirect transport evidence that a non-surface nickel-rich layer is produced.

引用

页码：1021 / 1024