PROPERTIES AND MICROSTRUCTURE OF HOT ISOSTATICALLY PRESSED Si3N4.

被引：0
|
作者：
Yeheskel, O. [1 ]
Gefen, Y. [1 ]
Talianker, M. [1 ]
机构：
[1] Ben Gurion Univ of the Negev, Beer-Sheva, Isr, Ben Gurion Univ of the Negev, Beer-Sheva, Isr
来源：
Materials science and engineering | 1986年 / 78卷 / 02期
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学科分类号：
摘要：
SILICON NITRIDE
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页码：209 / 216
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