PROPERTIES AND MICROSTRUCTURE OF HOT ISOSTATICALLY PRESSED Si3N4.

被引：0

作者：

Yeheskel, O. ^{[1
]}

Gefen, Y. ^{[1
]}

Talianker, M. ^{[1
]}

机构：

[1] Ben Gurion Univ of the Negev, Beer-Sheva, Isr, Ben Gurion Univ of the Negev, Beer-Sheva, Isr

来源：

Materials science and engineering | 1986年 / 78卷 / 02期

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D O I：

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学科分类号：

摘要：

SILICON NITRIDE

引用

页码：209 / 216

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[1] PROPERTIES AND MICROSTRUCTURE OF HOT ISOSTATICALLY PRESSED SI3N4
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[9] HOT ISOSTATICALLY PRESSED SI3N4-SI3N4 JOINTS BONDED WITH OXYNITRIDE GLASS
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