Dissociation process in plasma-enhanced chemical vapor deposition using tetraethoxysilane

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Maeda, Naohiro
Okimura, Kunio
Shibata, Akira
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Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi) | 1999年 / 129卷 / 04期
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页码：32 / 38
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