SELECTIVE LPCVD-W DEPOSITION ON SILICIDES.

被引：0
|
作者：
Zhang, S-L. [1 ]
Ostling, M. [1 ]
Niemi, E. [1 ]
Norstrom, H. [1 ]
Peterson, C.S. [1 ]
机构：
[1] Royal Inst of Technology, Stockholm, Swed, Royal Inst of Technology, Stockholm, Swed
来源：
Vide, les Couches Minces | 1987年 / 42卷 / 236期
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摘要：
TUNGSTEN COMPOUNDS
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页码：195 / 197
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