COMPUTER SIMULATION OF THE ION SPUTTER PROFILING PROCESS.

被引：0
|
作者：
Qu, Zhe [1 ]
Xie, Tiansheng [1 ]
机构：
[1] Acad Sinica, Shenyang, China, Acad Sinica, Shenyang, China
来源：
Jinshu Xuebao/Acta Metallurgica Sinica | 1986年 / 22卷 / 05期
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摘要：
SPUTTERING
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