FORMATION AND GROWTH MECHANISM OF POROUS, AMORPHOUS, AND FINE PARTICLES PREPARED BY CHEMICAL VAPOR DEPOSITION. TITANIA FROM TITANIUM TETRAISOPROPOXIDE.

被引:0
|
作者
Kirkbir, Fikret [1 ]
Komiyama, Hiroshi [1 ]
机构
[1] Univ of Tokyo, Tokyo, Jpn, Univ of Tokyo, Tokyo, Jpn
来源
| 1600年 / 65期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
POWDERS
引用
收藏
相关论文
共 50 条
  • [21] The effect of substrates on the characteristics of titania nano-coated particles prepared by fluidized bed chemical vapor deposition (FBCVD)
    Park, Jaehyeon
    Lee, Seung Young
    Bae, Dal-Hee
    Lim, Nam-Yun
    Ha, Jinwook
    ECO-MATERIALS PROCESSING & DESIGN VII, 2006, 510-511 : 126 - 129
  • [22] Evolution of the morphology of diamond particles and mechanism of their growth during the synthesis by chemical vapor deposition
    N. A. Feoktistov
    S. A. Grudinkin
    V. G. Golubev
    M. A. Baranov
    K. V. Bogdanov
    S. A. Kukushkin
    Physics of the Solid State, 2015, 57 : 2184 - 2190
  • [23] Evolution of the Morphology of Diamond Particles and Mechanism of Their Growth during the Synthesis by Chemical Vapor Deposition
    Feoktistov, N. A.
    Grudinkin, S. A.
    Golubev, V. G.
    Baranov, M. A.
    Bogdanov, K. V.
    Kukushkin, S. A.
    PHYSICS OF THE SOLID STATE, 2015, 57 (11) : 2184 - 2190
  • [24] The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition
    Cervenka, J.
    Ledinsky, M.
    Stuchlik, J.
    Stuchlikova, H.
    Bakardjieva, S.
    Hruska, K.
    Fejfar, A.
    Kocka, J.
    NANOTECHNOLOGY, 2010, 21 (41)
  • [25] TIO2 PARTICLES BY CHEMICAL VAPOR-DEPOSITION - PARTICLE FORMATION MECHANISM AND CHEMICAL-KINETICS
    KANAI, T
    KOMIYAMA, H
    INOUE, H
    KAGAKU KOGAKU RONBUNSHU, 1985, 11 (03) : 317 - 323
  • [26] Structure of amorphous hydrogenated carbon films prepared by radio frequency plasma enhanced chemical vapor deposition. An analogy with the structure zone model developed for metals
    Dumay, B
    Finot, E
    Theobald, M
    Legaie, O
    Durand, J
    Baclet, P
    Goudonnet, JP
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (11) : 6572 - 6581
  • [27] PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON PREPARED BY CHEMICAL VAPOR-DEPOSITION FROM HIGHER SILANES
    DELAHOY, AE
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 407 : 47 - 54
  • [28] CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-SILICON PREPARED FROM SIF2 GAS
    JANAI, M
    WEIL, R
    LEVIN, KH
    PRATT, B
    KALISH, R
    BRAUNSTEIN, G
    TEICHER, M
    WOLF, M
    JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3622 - 3624
  • [29] Growth mechanism of Ru films prepared by chemical vapor deposition using bis(ethylcyclopentadienyl)ruthenium precursor
    Matsui, Y
    Hiratani, M
    Nabatame, T
    Shimamoto, Y
    Kimura, S
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2001, 4 (02) : C9 - C12
  • [30] Determination of photocatalytic activity in amorphous and crystalline titanium oxide films prepared using plasma-enhanced chemical vapor deposition
    Wu, Cheng-Yang
    Chiang, Bo-Sheng
    Chang, Springfield
    Liu, Day-Shan
    APPLIED SURFACE SCIENCE, 2011, 257 (06) : 1893 - 1897