Growth of nanoscale Si nuclei on SiO2 by rapid thermal chemical vapor deposition

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Dept. d'Enginyeria Electronica, Univ. Autònoma de Barcelona, 08193 Bellaterra, Barcelona, Spain ^{[1
]}

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]}

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J Electrochem Soc | / 11卷 / 4219-4225期

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摘要：

Semiconducting films

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