Characterization of directly deposited silicon films using low-energy focused ion beam

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作者：
Yanagisawa, Junichi [1 ]
Onishi, Noriyuki [1 ]
Nakayama, Hiromasa [1 ]
Gamo, Kenji [1 ]
机构：
[1] Osaka Univ, Osaka, Japan
来源：
| 1996年 / 35期
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