Al-Cu alloy etching using in-reactor aluminium chloride formation in static magnetron triode reactive ion etching

被引：0

作者：

Sato, Masaaki ^{[1
]}

Arita, Yoshinobu ^{[1
]}

机构：

[1] NTT LSI lab, Kanagawa, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1993年 / 32卷 / 6 B期

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摘要：

引用

页码：3013 / 3018

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