WAFER COOLING IN A HIGH CURRENT ION IMPLANTER.

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作者：
Benveniste, V. [1 ]
机构：
[1] Eaton Corp, Beverly, MA, USA, Eaton Corp, Beverly, MA, USA
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期
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8
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页码：366 / 371
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