EFFECT OF DEPOSITION RATE AND SUBSTRATE TEMPERATURE ON PROPERTIES OF CdTe FILM.

被引:0
|
作者
Kawai, Yoshiji
Ema, Yoshinori
Hayashi, Toshiya
机构
来源
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes | 1983年 / 22卷 / 05期
关键词
D O I
10.1143/jjap.22.803
中图分类号
TM2 [电工材料]; TN [电子技术、通信技术];
学科分类号
0805 ; 080502 ; 080801 ; 0809 ;
摘要
The effects of the deposition rate and the substrate temperature on the structure and the electrical and optical properties of CdTe film evaporated on an Au-coated glass substrate were investigated, and the film quality is discussed here. It is shown that the crystalline size decreased with the deposition rate and increased with the substrate temperature, and that the stoichiometry of the film was best at the deposition rate of 17 A sec** minus **1 at room temperature. At a lower deposition rate, the film became Cd-rich and n-type, while it became Te-rich and p-type at a higher deposition rate. The Cd content increased with the substrate temperature. The films deposited at lower rates were polycrystalline and those deposited at higher rates were amorphous. The film deposited at a rate of 17 A sec** minus **1-19 A sec** minus **1 and a substrate temperature of 100 degree C showed the highest quality of all the films.
引用
收藏
页码:803 / 807
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