Development Trends in Unipolar Technology for LSI Integrated Circuits.

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作者：
Georgijew, W.
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Elektronika | 1979年 / 20卷 / 02期
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Problems concerned with realization of submicron sizes in VLSI circuits are considered. The present state and possibilities of future development are described, with emphasis on lithographic technologies of submicron sizes. Physical properties of semiconductors as well as a method of electron beam lithography do not limit fundamentally the realization of VLSI circuits with 10**9 elements on a structure at minimal linear sizes of the order of 0. 1 mu m.
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页码：57 / 59
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