Plasma damage and photo-annealing effects of thin gate oxides and oxynitrides during O2 plasma exposure

被引：0
|
作者：
Rockwell Int, Newport Beach, United States [1 ]
机构：
来源：
IEEE Electron Device Lett | / 3卷 / 82-84期
关键词：
Manuscript received August 15; 1995; revised November 1; 1995. This work was supported by SRCKEMATECH under Contract 93-MC-505. K. Lai is with Rockwell International; Newport Beach; CA; 92658; USA; K; Kumar; A; Chou; and 1. C. Lee are with the Microelectronic Research Center; University of Texas at Austin; Austin TX 78712 USA. Publisher Item Identifier S 0741-3 106(96)01960-X;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
11
引用
收藏
相关论文
共 50 条
  • [41] Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition, using O2 plasma and N2O plasma
    Kim, Seokhoon
    Kim, Jinwoo
    Choi, Jihoon
    Kang, Hyunseok
    Jeon, Hyeongtag
    Bae, Choelhwyi
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (03): : 1088 - 1093
  • [42] Prevention of plasma-induced damage on thin gate oxides in BEOL sub-half micron CMOS processing
    贺琪
    赵文彬
    彭力
    于宗光
    Journal of Semiconductors, 2013, (06) : 170 - 173
  • [43] Prevention of plasma-induced damage on thin gate oxides in BEOL sub-half micron CMOS processing
    He Qi
    Zhao Wenbin
    Peng Li
    Yu Zongguang
    JOURNAL OF SEMICONDUCTORS, 2013, 34 (06)
  • [44] Prevention of plasma-induced damage on thin gate oxides in BEOL sub-half micron CMOS processing
    贺琪
    赵文彬
    彭力
    于宗光
    Journal of Semiconductors, 2013, 34 (06) : 170 - 173
  • [45] Effects of He and Ar ion kinetic energies in protection of organosilicate glass from O2 plasma damage
    Lee, Joe
    Kazi, Haseeb
    Gaddam, Sneha
    Kelber, Jeffry A.
    Graves, David B.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2013, 31 (04):
  • [46] Combinational Effects of Oxygen Plasma Irradiation and Annealing on LiMn2O4 Thin Film Cathodes
    Chen, Chen Chung
    Chiu, Kuo-Feng
    Lin, Kun Ming
    Lin, Hsin Chih
    Yang, Chang-Rung
    Wang, Fu Ming
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2011, 158 (03) : A262 - A265
  • [47] Oxygen Effects on a He/O2 Plasma Jet at Atmospheric Pressure
    Wang, Shouguo
    Wan, Jun
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2009, 37 (04) : 551 - 554
  • [48] Effects of O2 Plasma Treatments on the Photolithographic Patterning of PEDOT:PSS
    Zheng, Deng-Yun
    Chang, Meng-Hsiang
    Pan, Ci-Ling
    Oh-e, Masahito
    COATINGS, 2021, 11 (01) : 1 - 12
  • [49] Furnace O2 Annealing Growth of Er2O3 Thin Film for Gate Stack Capacitance at Low Temperature
    Woo, Jong-Chang
    Joo, Young-Hee
    Kim, Gwan-Ha
    Kim, Sang-Yong
    Hwang, Jin-Ho
    Kim, Chang-Il
    SCIENCE OF ADVANCED MATERIALS, 2017, 9 (07) : 1213 - 1216
  • [50] Effects of O2 thermal annealing on the properties of CVD Ta2O5 thin films
    Lee, JS
    Chang, SJ
    Chen, JF
    Sun, SC
    Liu, CH
    Liaw, UH
    MATERIALS CHEMISTRY AND PHYSICS, 2003, 77 (01) : 242 - 247
12345