Blanked aperture array for parallel electron beam lithography

被引：0
|
作者：
Winograd, G.I.
Pease, R.F.W.
McCord, M.A.
机构：
来源：
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1997年 / 15卷 / 06期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Dose control circuit for digital electrostatic electron-beam array lithography
    Chandra Sekhar A. Durisety
    Rajagopal Vijayraghavan
    Lakshmipriya Seshan
    Syed K. Islam
    Benjamin J. Blalock
    Analog Integrated Circuits and Signal Processing, 2006, 48 : 143 - 150
  • [22] PROJECTION ELECTRON LITHOGRAPHY USING APERTURE LENSES
    HEYNICK, LN
    WESTERBERG, ER
    HARTELIUS, CC
    LEE, RE
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 399 - 409
  • [23] Solid-state Nanopore Array Membranes Patterned by Electron Beam Lithography, Nanosphere Lithography and Aluminum Anodization
    Wu, S.
    Klein, M. J. K.
    Vazquez-Mena, O.
    Auzelyte, V.
    Savu, V.
    Blondiaux, N.
    Montagne, F.
    Heinzelmann, H.
    Pugin, R.
    Brugger, J.
    PROCEEDINGS OF THE 8TH INTERNATIONAL CONFERENCE ON MULTI-MATERIAL MICRO MANUFACTURE (4M 2011), 2011, : 225 - 229
  • [24] ELECTRON-BEAM LITHOGRAPHY
    HERRIOTT, DR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 781 - 785
  • [25] ELECTRON-BEAM LITHOGRAPHY
    EVERHART, TE
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (03): : 276 - 276
  • [26] Electron-beam lithography
    Oczos, Kazimierz
    Mechanik, 1988, 61 (07): : 341 - 343
  • [27] Nanometer electron beam lithography
    Ochiai, Y
    Manako, S
    Fujita, J
    Nomura, E
    NEC RESEARCH & DEVELOPMENT, 1999, 40 (04): : 388 - 392
  • [28] Nanometer Electron Beam lithography
    Ochiai, Yukinori
    Manako, Shoko
    Fujita, Jun-Ichi
    Nomura, Eiichi
    NEC Research and Development, 1999, 40 (04): : 388 - 392
  • [29] ELECTRON-BEAM LITHOGRAPHY
    HERRIOTT, DR
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C102 - C102
  • [30] ELECTRON-BEAM LITHOGRAPHY
    PEASE, RFW
    CONTEMPORARY PHYSICS, 1981, 22 (03) : 265 - 290
12345