共 50 条
- [1] Blanked aperture array for parallel electron beam lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06): : 2289 - 2292
- [2] Multiplexed blanker array for parallel electron beam lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3174 - 3176
- [3] Ion beam aperture-array lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06): : 2529 - 2532
- [4] ELECTRON-BEAM ARRAY LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 953 - 957
- [5] Fast electron beam lithography system with 1024 beams individually controlled by blanking aperture array Yasuda, Hiroshi, 1600, (32):
- [6] FAST-ELECTRON BEAM LITHOGRAPHY SYSTEM WITH 1024 BEAMS INDIVIDUALLY CONTROLLED BY BLANKING APERTURE ARRAY JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12B): : 6012 - 6017
- [7] Estimation of scattered particle exposure in ion beam aperture array lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (06): : 2915 - 2919
- [8] ELECTRON-BEAM ARRAY LITHOGRAPHY STITCHING EXPERIMENTS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 958 - 962
- [9] Digital electrostatic electron-beam array lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2646 - 2650