X-ray scattering from silicon surfaces

被引：0
|
作者：
Stoemmer, R. [1 ]
Goebel, H. [1 ]
Martin, A.R. [1 ]
Hub, W. [1 ]
Pietsch, U. [1 ]
机构：
[1] Siemens AG, Munich, Germany
来源：
Semiconductor International | 1998年 / 21卷 / 05期
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页码：81 / 82
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