Carbon contamination in an etching reactor using electron cyclotron resonance plasma and the effect of a N2 addition

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VLSI Laboratory, Fujitsu VLSI Ltd., 1500 Mizono Tado-cho, Kuwana-gun, Mie 511-01, Japan [1 ]
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J. Vac. Sci. Technol. A Vac. Surf. Films | / 3卷 / 1413-1417期
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