Charge trapping versus buried oxide thickness for SIMOX structures

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[1] Lawrence, R.K.
[2] Ioannou, D.E.
[3] Hughes, H.L.
[4] McMarr, P.J.
[5] Mrstik, B.J.
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Lawrence, R.K. | 1600年 / IEEE, Piscataway, NJ, United States卷 / 42期
关键词：
Radiation effects;
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