SCALED CMOS TECHNOLOGY USING SEG ISOLATION AND BURIED WELL PROCESS.

被引：0
|
作者：
Endo, Nobuhiro [1 ]
Kasai, Naoki [1 ]
Ishitani, Akihiko [1 ]
Kitajima, Hiroshi [1 ]
Kurogi, Yukinori [1 ]
机构：
[1] NEC, Kawasaki, Jpn, NEC, Kawasaki, Jpn
来源：
IEEE Transactions on Electron Devices | 1986年 / ED-33卷 / 11期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
16
引用
收藏
页码：1659 / 1666
相关论文
共 50 条
  • [31] Colour detection using a buried double p-n junction structure implemented in the CMOS process
    Lu, GN
    Chouikha, MB
    Sou, G
    Sedjil, M
    ELECTRONICS LETTERS, 1996, 32 (06) : 594 - 596
  • [32] PROCESS AND DEVICE PERFORMANCE OF 1 MU-M-CHANNEL NORMAL-WELL CMOS TECHNOLOGY
    YAMAGUCHI, T
    MORIMOTO, S
    KAWAMOTO, GH
    DELACY, JC
    IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1984, 19 (01) : 71 - 80
  • [33] PROCESS AND DEVICE PERFORMANCE OF 1-MU-M-CHANNEL N-WELL CMOS TECHNOLOGY
    YAMAGUCHI, T
    MORIMOTO, S
    KAWAMOTO, GH
    DELACY, JC
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (02) : 205 - 214
  • [34] SILICON-GATE N-WELL CMOS PROCESS BY FULL ION-IMPLANTATION TECHNOLOGY
    OHZONE, T
    SHIMURA, H
    TSUJI, K
    HIRAO, T
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (09) : 1789 - 1795
  • [35] Antenna-on-Chip for Millimeter Wave Applications Using CMOS Process Technology
    Chung, Ming-An
    Chen, Yu-Hsun
    Meiy, Ing-Peng
    Goudos, Sotirios K.
    TELECOM, 2023, 4 (01): : 146 - 164
  • [36] CMOS DEVICE ISOLATION USING THE SELECTIVE-ETCH-AND-REFILL-WITH-EPI (SEREPI) PROCESS
    KAMINS, TI
    CHIANG, SY
    IEEE ELECTRON DEVICE LETTERS, 1985, 6 (12) : 617 - 619
  • [37] On-chip skin color detection using a triple-well CMOS process
    Boussaid, F
    Chai, D
    Bouzerdoum, A
    MICROELECTRONICS: DESIGN, TECHNOLOGY, AND PACKAGING, 2004, 5274 : 206 - 214
  • [38] Silicon dioxide deposited by using liquid phase deposition at room temperature for nanometer-scaled isolation technology
    Kim, Kyoung Seob
    Roh, Yonghan
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 51 (03) : 1191 - 1194
  • [39] A new strategy for the synthesis of monomethylhydrazine using the Raschig process. 2: Continuous synthesis of stoichiometric monochloramine using the microreactor technology
    D. M. Le
    A. J. Bougrine
    O. Duclos
    V. Pasquet
    H. Delalu
    Reaction Kinetics, Mechanisms and Catalysis, 2020, 130 : 17 - 34
  • [40] Substrate Noise Isolation Improvement by Helium-3 Ion Irradiation Technique in a Triple-well CMOS Process
    Li, Ning
    Inoue, Takeshi
    Hirano, Takuichi
    Pang, Jian
    Wu, Rui
    Okada, Kenichi
    Sakane, Hitoshi
    Matsuzawa, Akira
    ESSDERC 2015 PROCEEDINGS OF THE 45TH EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE, 2015, : 254 - 257
12345