Ion energy distribution during magnetron sputtering enhanced with an inductively coupled rf plasma

被引：0

作者：

Matsuura, Masamichi ^{[1
]}

Yamamoto, Tadashi ^{[1
]}

Morita, Tadashi ^{[1
]}

Kurauchi, Toshiharu ^{[1
]}

机构：

[1] ULVAC JAPAN Ltd, Ibaraki, Japan

来源：

Shinku/Journal of the Vacuum Society of Japan | 1998年 / 41卷 / 03期

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摘要：

引用

页码：147 / 150

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