Ion energy distribution during magnetron sputtering enhanced with an inductively coupled rf plasma

被引：0
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作者：
Matsuura, Masamichi [1 ]
Yamamoto, Tadashi [1 ]
Morita, Tadashi [1 ]
Kurauchi, Toshiharu [1 ]
机构：
[1] ULVAC JAPAN Ltd, Ibaraki, Japan
来源：
Shinku/Journal of the Vacuum Society of Japan | 1998年 / 41卷 / 03期
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摘要：
7
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页码：147 / 150
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