Microstructure and magnetic properties of ferrite thin films prepared by sputtering and plating

被引：0
|
作者：
Kitamoto, Yoshitaka [1 ]
Nakagawa, Shigeki [1 ]
Abe, Masanori [1 ]
Naoe, Masahiko [1 ]
机构：
[1] Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan
来源：
Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy | 2000年 / 47卷 / 02期
关键词：
D O I：
10.2497/jjspm.47.165
中图分类号：
学科分类号：
摘要：
14
引用
收藏
页码：165 / 170
相关论文
共 50 条
  • [21] MICROSTRUCTURE OF COCR THIN-FILMS PREPARED BY SPUTTERING
    FUTAMOTO, M
    HONDA, Y
    KAKIBAYASHI, H
    SHIMOTSU, T
    UESAKA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1985, 24 (06): : L460 - L462
  • [22] Microstructure, magnetic and nanomechanical properties of FeTaN films prepared by co-sputtering
    Mackay, K
    Papakonstantinou, P
    Dodd, PM
    Atkinson, R
    Pollard, RJ
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (01) : 41 - 47
  • [23] Microstructure and magnetic properties of NdFeB/Mo multilayered films prepared by magnetron sputtering
    Fu, Yudong
    Yan, Feng
    Zhu, Xiaoshuo
    Feng, Xiaoxue
    Guo, Zaizai
    MODERN PHYSICS LETTERS B, 2016, 30 (08):
  • [24] MAGNETIC-PROPERTIES OF FERROMAGNETIC THIN-FILMS PREPARED BY ION PLATING
    TAKAO, M
    OHTA, Y
    TASAKI, A
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (02) : 259 - 265
  • [25] Magnetic properties of barium ferrite thin films prepared at high deposition rates
    Kotnala, RK
    Bhatnagar, HM
    Kothari, PC
    NON-LINEAR ELECTROMAGNETIC SYSTEMS: ADVANCED TECHNIQUES AND MATHEMATICAL METHODS, 1998, 13 : 539 - 542
  • [26] Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering
    卓世异
    熊予莹
    顾敏
    半导体学报, 2009, 30 (05) : 14 - 17
  • [27] Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering
    Zhuo Shiyi
    Xiong Yuying
    Gu Min
    JOURNAL OF SEMICONDUCTORS, 2009, 30 (05)
  • [28] Microstructure,Mechanical,and Tribological Properties of CNx Thin Films Prepared by Reactive Magnetron Sputtering
    Xiangyang Chen
    Jin Zhang
    Shengli Ma
    Haixia Hu
    Zhebo Zhou
    Acta Metallurgica Sinica(English Letters), 2014, 27 (01) : 31 - 36
  • [29] Microstructure, Mechanical, and Tribological Properties of CNx Thin Films Prepared by Reactive Magnetron Sputtering
    Chen, Xiangyang
    Zhang, Jin
    Ma, Shengli
    Hu, Haixia
    Zhou, Zhebo
    ACTA METALLURGICA SINICA-ENGLISH LETTERS, 2014, 27 (01) : 31 - 36
  • [30] Microstructure, Mechanical, and Tribological Properties of CNx Thin Films Prepared by Reactive Magnetron Sputtering
    Xiangyang Chen
    Jin Zhang
    Shengli Ma
    Haixia Hu
    Zhebo Zhou
    Acta Metallurgica Sinica (English Letters), 2014, 27 : 31 - 36
12345