Lithography simulator for electron beam/deep UV intra-level mix & match

被引：0
|
作者：
Inanami, Ryoichi [1 ]
Nakasugi, Tetsuro [1 ]
Sato, Shinji [1 ]
Mimotogi, Shoji [1 ]
Tanaka, Satoshi [1 ]
Sugihara, Kazuyoshi [1 ]
机构：
[1] Microlectron. Engineering Laboratory, Toshiba Corporation, 8, Shin-sugita-cho, Isogo-ku, Yokohama 235-8522, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 12 B期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：7035 / 7039
相关论文
共 50 条
  • [1] Lithography simulator for electon beam/deep UV intra-level mix & match
    Inanami, R
    Nakasugi, T
    Sato, S
    Mimotogi, S
    Tanaka, S
    Sugihara, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1999, 38 (12B): : 7035 - 7039
  • [2] ELECTRON-BEAM DUV INTRA-LEVEL MIX-AND-MATCH LITHOGRAPHY FOR RANDOM LOGIC 0.25-MU-M CMOS
    JONCKHEERE, R
    TRITCHKOV, A
    VANDRIESSCHE, V
    VANDENHOVE, L
    MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) : 231 - 234
  • [3] Intra-level mix and match lithography with electron beam lithography and i-line stepper combined with resolution enhancement for structures below the CD-limit
    Helke, C.
    Canpolat-Schmidt, C. H.
    Heldt, G.
    Schermer, S.
    Hartmann, S.
    Voigt, A.
    Reuter, D.
    MICRO AND NANO ENGINEERING, 2023, 19
  • [4] Characterization of negative tone photoresist mr-EBL 6000.5 for i-line stepper and electron beam lithography for the Intra-Level Mix & Match Approach
    Schermer, S.
    Helke, C.
    Reinhardt, M.
    Hartmann, S.
    Tank, F.
    Wecker, J.
    Heldt, G.
    Voigt, A.
    Reuter, D.
    MICRO AND NANO ENGINEERING, 2024, 23
  • [5] Mix and match of nanoimprint and UV lithography
    Reuther, F
    Pfeiffer, K
    Fink, M
    Gruetzner, G
    Schulz, H
    Scheer, HC
    Gaboriau, F
    Cardinaud, C
    EMERGING LITHOGRAPHIC TECHNOLOGIES V, 2001, 4343 : 802 - 809
  • [6] Deep ultraviolet photolithography capability of ZEP520A electron beam resist for mix and match lithography
    Brown, Devin K.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06): : 2447 - 2450
  • [7] ELECTRON-BEAM OPTICAL INTRALEVEL MIX-AND-MATCH LITHOGRAPHY FOR DEEP SUBMICRON DEVICE FABRICATION
    MATSUDA, T
    IWADATE, K
    TANAKA, A
    KAWAI, Y
    KOMATSU, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1914 - 1918
  • [8] Intra-level mix-and-match lithography process for fabricating sub-100-nm complementary metal-oxide-semiconductor devices using the JBX-9300FS point-electron-beam system
    Narihiro, M
    Wakabayashi, H
    Ueki, M
    Arai, K
    Ogura, T
    Ochiai, Y
    Mogami, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (12B): : 6843 - 6848
  • [9] Multistep profiles by mix and match of nanoimprint and UV lithography
    Pfeiffer, K
    Fink, A
    Gruetzner, G
    Bleidiessel, G
    Schulz, H
    Scheer, H
    MICROELECTRONIC ENGINEERING, 2001, 57-8 : 381 - 387
  • [10] Intra-level mix-and-match lithography process for fabricating sub-100-nm complementary metal-oxide-semiconductor devices using the JBX-9300FS point-electron-beam system
    Narihiro, Mitsuru
    Wakabayashi, Hitoshi
    Ueki, Makoto
    Arai, Kohichi
    Ogura, Takashi
    Ochiai, Yukinori
    Mogami, Tohru
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 2000, 39 (12): : 6843 - 6848
12345