Determination of the Contact Potential Difference PHI MS Metal-Semiconductor by the Method of Analysis of the C-V Characteristics of a MIS Capacitor.

被引：0

作者：

Jakubowski, Andrzej

机构：

来源：

Elektronika Warszawa | 1980年 / 21卷 / 10期

关键词：

CAPACITORS; -; Analysis;

D O I：

暂无

中图分类号：

TN [电子技术、通信技术];

学科分类号：

0809 ;

摘要：

The method of determining metal-semiconductor work function difference PHI //M//S based on the analysis of high-frequency MIS capacitor C-V characteristics has been described. The procedure to follow as well as sources of errors made when applying the method have been discussed.

引用

页码：15 / 18