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Adsorbate-induced faceting of high-index semiconductor surfaces: antimony adsorbed on Ge(103)
被引:0
|
作者
:
Falkenberg, G.
论文数:
0
引用数:
0
h-index:
0
机构:
II. Inst. fur Experimentalphysik, Universität Hamburg, Luruper Chaussee 149, D-22761 Hamburg, Germany
II. Inst. fur Experimentalphysik, Universität Hamburg, Luruper Chaussee 149, D-22761 Hamburg, Germany
Falkenberg, G.
[
1
]
Johnson, R.L.
论文数:
0
引用数:
0
h-index:
0
机构:
II. Inst. fur Experimentalphysik, Universität Hamburg, Luruper Chaussee 149, D-22761 Hamburg, Germany
II. Inst. fur Experimentalphysik, Universität Hamburg, Luruper Chaussee 149, D-22761 Hamburg, Germany
Johnson, R.L.
[
1
]
机构
:
[1]
II. Inst. fur Experimentalphysik, Universität Hamburg, Luruper Chaussee 149, D-22761 Hamburg, Germany
来源
:
Applied Surface Science
|
1999年
/ 142卷
/ 01期
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:
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页码:81 / 87
相关论文
共 22 条
[1]
Adsorbate-induced faceting of high-index semiconductor surfaces: antimony adsorbed on Ge(103)
Falkenberg, G
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hamburg, Inst Expt Phys 2, D-22761 Hamburg, Germany
Univ Hamburg, Inst Expt Phys 2, D-22761 Hamburg, Germany
Falkenberg, G
Johnson, RL
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hamburg, Inst Expt Phys 2, D-22761 Hamburg, Germany
Univ Hamburg, Inst Expt Phys 2, D-22761 Hamburg, Germany
Johnson, RL
APPLIED SURFACE SCIENCE,
1999,
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[2]
Adsorbate-induced reconstructions and nanostructures on high-index copper surfaces
Wee, ATS
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0
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Natl Univ Singapore, Dept Phys, Singapore 119260, Singapore
Natl Univ Singapore, Dept Phys, Singapore 119260, Singapore
Wee, ATS
Guo, YP
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Natl Univ Singapore, Dept Phys, Singapore 119260, Singapore
Natl Univ Singapore, Dept Phys, Singapore 119260, Singapore
Guo, YP
Tan, KC
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Natl Univ Singapore, Dept Phys, Singapore 119260, Singapore
Natl Univ Singapore, Dept Phys, Singapore 119260, Singapore
Tan, KC
Wang, HQ
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Natl Univ Singapore, Dept Phys, Singapore 119260, Singapore
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Natl Univ Singapore, Dept Phys, Singapore 119260, Singapore
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[3]
New surfaces stabilized by adsorbate-induced faceting
Kaghazchi, Payam
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Univ Ulm, Inst Elektrochem, D-89069 Ulm, Germany
Univ Ulm, Inst Elektrochem, D-89069 Ulm, Germany
Kaghazchi, Payam
Jacob, Timo
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Univ Ulm, Inst Elektrochem, D-89069 Ulm, Germany
Univ Ulm, Inst Elektrochem, D-89069 Ulm, Germany
Jacob, Timo
Ermanoski, Ivan
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Sandia Natl Labs, Albuquerque, NM 87185 USA
Univ Ulm, Inst Elektrochem, D-89069 Ulm, Germany
Ermanoski, Ivan
Chen, Wenhua
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Chen, Wenhua
Madey, Theodore E.
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Madey, Theodore E.
JOURNAL OF PHYSICS-CONDENSED MATTER,
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Simulation of adsorbate-induced faceting on curved surfaces
Niewieczerzal, D
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0
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h-index:
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机构:
Univ Wroclaw, Inst Theoret Phys, PL-50204 Wroclaw, Poland
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[5]
Adsorbate-induced faceting: The case of Ag on vicinal Cu surfaces
Coati, A
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0
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Coati, A
Creuze, J
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ADSORBATE-INDUCED RECONSTRUCTION OF SURFACES - AN ATOMISTIC ALTERNATIVE TO MICROSCOPIC FACETING
WOODRUFF, DP
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A comparison of adsorbate-induced faceting on flat and curved crystal surfaces
Szczepkowicz, A
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0
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Ciszewski, A
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Adsorbate-induced faceting of metal surfaces: A form of nanoscale self-replication
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QUASI-PERIODIC NANOSCALE FACETING OF HIGH-INDEX SI SURFACES
BASKI, AA
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BASKI, AA
WHITMAN, LJ
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WHITMAN, LJ
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RHEED STUDIES OF STEPS, ISLANDING AND FACETING ON SINGULAR, VICINAL AND HIGH-INDEX SURFACES
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DAWERITZ, L
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