IN SITU STUDY OF CASCADE DEFECTS IN SILVER BY SIMULTANEOUS TRANSMISSION ELECTRON MICROSCOPY AND ELECTRICAL RESISTIVITY MEASUREMENTS AT LOW TEMPERATURES.

被引：0
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作者：
Haga, K. [1 ]
King, Wayne E. [1 ]
Merkle, K.L. [1 ]
Meshii, M. [1 ]
机构：
[1] Northwestern Univ, Evanston, IL, USA, Northwestern Univ, Evanston, IL, USA
来源：
| 1600年 / B16期
关键词：
ELECTRIC MEASUREMENTS - Resistance - MICROSCOPES; ELECTRON; -; Applications;
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摘要：
A helium-cooled double-tilt specimen stage for transmission electron microscopy (TEM) with the capability of simultaneous electrical resistivity measurements was constructed and used to study defect-production, migration, clustering and recovery processes in ion-irradiated silver. Vacuum-evaporated thin film specimens were irradiated with 1 MeV Kr** plus -ions up to a dose of 4. 0 multiplied by 10**1**0 ions/cm**2, at T equals 10 K in the microscope, using the HVEM-tandem accelerator ion beam interface system in the Argonne National Laboratory Electron Microscopy Center. Cascade defect formation during ion bombardment at the low temperature was directly observed both by TEM and electrical resistivity measurements.
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