共 50 条
- [31] Composition control of lead zirconate titanate thin films in electron cyclotron resonance plasma enhanced chemical vapor deposition system 1996, JJAP, Minato-ku, Japan (35):
- [32] Composition control of lead zirconate titanate thin films in electron cyclotron resonance plasma enhanced chemical vapor deposition system JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (5A): : 2726 - 2730
- [33] Microcrystalline silicon films deposited by electron cyclotron resonance plasma chemical vapor deposition using helium gas JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1996, 35 (10A): : L1241 - L1244
- [34] Characteristics of amorphous and polycrystalline silicon films deposited at 120°C by electron cyclotron resonance plasma-enhanced chemical vapor deposition Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1998, 16 (3 pt 2):
- [35] Characteristics of amorphous and polycrystalline silicon films deposited at 120 °C by electron cyclotron resonance plasma-enhanced chemical vapor deposition JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (03): : 1912 - 1916
- [36] Effect of aging on stress in silicon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition technique SILICON NITRIDE AND SILICON DIOXIDE THIN INSULATING FILMS, 1999, 99 (06): : 26 - 37
- [37] Plasma etch resistance of polymeric carbon thin films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 218 : U435 - U435
- [39] RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance-plasma enhanced chemical vapor deposition PHOTODETECTORS: MATERIALS AND DEVICES III, 1998, 3287 : 341 - 348