Electrical properties of PZT thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

被引：0
|
作者：
Korea Advanced Inst of Science and, Technology, Taejon, Korea, Republic of [1 ]
机构：
来源：
Mater Chem Phys | / 2卷 / 155-158期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Thermal stability of a-C:F,H films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition
    Theil, JA
    Mertz, F
    Yairi, M
    Seaward, K
    Ray, G
    Kooi, G
    LOW-DIELECTRIC CONSTANT MATERIALS III, 1997, 476 : 31 - 36
  • [22] Analysis of stress and composition of silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition for microfabrication processes
    Cianci, E
    Pirola, F
    Foglietti, V
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (01): : 168 - 172
  • [23] A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by rf plasma and by electron cyclotron resonance plasma
    Kim, JS
    Jun, BH
    Lee, EJ
    Hwang, CY
    Lee, WJ
    THIN SOLID FILMS, 1997, 292 (1-2) : 124 - 129
  • [24] Effects of deposition parameters on composition, structure, resistivity and step coverage of TiN thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition
    Kim, JS
    Lee, EJ
    Baek, JT
    Lee, WJ
    THIN SOLID FILMS, 1997, 305 (1-2) : 103 - 109
  • [25] Electrical properties of silicon nitride films grown on a SiGe layer by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition
    DufourGergam, E
    Meyer, F
    Delmotte, F
    Hugon, MC
    Agius, B
    Warren, P
    Dutartre, D
    THIN SOLID FILMS, 1997, 294 (1-2) : 214 - 216
  • [26] Dielectric properties of silicon nitride films deposited by microwave electron cyclotron resonance plasma chemical vapor deposition at low temperature
    Ye, C
    Ning, ZY
    Shen, MG
    Wang, H
    Gan, ZQ
    APPLIED PHYSICS LETTERS, 1997, 71 (03) : 336 - 337
  • [27] Characterization of ZnO thin film deposited by electron cyclotron resonance plasma-assisted chemical vapor deposition
    Sakaguchi, I
    Ryoken, H
    Hishita, S
    Haneda, H
    THIN SOLID FILMS, 2006, 506 : 184 - 187
  • [28] Preparation of amorphous fluoride films by electron cyclotron resonance plasma-enhanced chemical vapor deposition
    Shojiya, M
    Takahashi, S
    Teramoto, M
    Konishi, A
    Kawamoto, Y
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2001, 284 (1-3) : 153 - 159
  • [29] Nitrogenated amorphous carbon films synthesized by electron cyclotron resonance plasma enhanced chemical vapor deposition
    Chan, WC
    Fung, MK
    Bello, I
    Lee, CS
    Lee, ST
    DIAMOND AND RELATED MATERIALS, 1999, 8 (8-9) : 1732 - 1736
  • [30] Substrate effects on the epitaxial growth of AlN thin films using electron cyclotron resonance plasma enhanced chemical vapor deposition
    Soh, JW
    Kim, JH
    Lee, WJ
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1996, 35 (11B): : L1518 - L1520
12345