Real-time monitoring and control of plasma etching

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作者：
Sarfaty, Moshe [1 ]
Baum, Chris [1 ]
Harper, Michael [1 ]
Hershkowitz, Noah [1 ]
Shohet, Juda L. [1 ]
机构：
[1] Univ of Wisconsin-Madison, Madison, United States
来源：
| 1998年 / JJAP, Tokyo, Japan卷 / 37期
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