MASCOT: mask pattern correction tool using genetic algorithm

被引：0
|
作者：
Haruki, Tamae [1 ]
Asai, Satoru [1 ]
Nakagawa, Kenji [1 ]
Hanyu, Isamu [1 ]
机构：
[1] Fujitsu Ltd, Kanagawa, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1996年 / 35卷 / 12 B期
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摘要：
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页码：6347 / 6695
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