Radio-frequency excited plasma at atmospheric pressure - A new dimension in plasma processing

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作者：
Schlemm, H.
Roth, D.
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Galvanotechnik | 2001年 / 92卷 / 06期
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摘要：
Using the new RF excited process, it is possible to operate at up to 100 mbar pressure, or using helium as make-up gas, at atmospheric pressure, depending on the gas used. Using micro-patterned electrodes, plastic surfaces can be processed. In another application, diamondlike carbon (DLC) coatings can be formed on silicon, at deposition rates between 1 and 10 μm/min.
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页码：1656 / 1661
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