Growth behavior of pulsed-laser-deposited PLZTO thin films

被引:0
|
作者
Tseng, Tzu-Feng [1 ]
Liu, Kuo-Shung [1 ]
Lin, I-Nan [1 ]
Wang, Jyh-Ping [1 ]
Ling, Yong-Chien [1 ]
机构
[1] Natl Tsing-Hua Univ, Hsinchu, Taiwan
来源
AIChE Journal | 1997年 / 43卷 / 11 A期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
13
引用
收藏
页码:2857 / 2864
相关论文
共 50 条
  • [41] Growth and characterization of pulsed-laser-deposited polycrystalline Bi3.33SM0.67Ti3O12 ferroelectric thin films
    Hu, XB
    Garg, A
    Barber, ZH
    MATERIALS LETTERS, 2005, 59 (19-20) : 2583 - 2587
  • [42] Photoluminescence of localized excitons in pulsed-laser-deposited GaN
    Cazzanelli, M
    Cole, D
    Donegan, JF
    Lunney, JG
    Middleton, PG
    O'Donnell, KP
    Vinegoni, C
    Pavesi, L
    APPLIED PHYSICS LETTERS, 1998, 73 (23) : 3390 - 3392
  • [43] On the growth mechanism of pulsed-laser deposited vanadium oxide thin films
    Ramana, C
    Smith, RJ
    Hussain, OM
    Julien, CM
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2004, 111 (2-3): : 218 - 225
  • [44] Growth and characteristics of reactive pulsed laser deposited molybdenum trioxide thin films
    Hussain, OM
    Rao, KS
    Madhuri, KV
    Ramana, CV
    Naidu, BS
    Pai, S
    John, J
    Pinto, R
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2002, 75 (03): : 417 - 422
  • [45] Growth and characteristics of reactive pulsed laser deposited molybdenum trioxide thin films
    O.M. Hussain
    K. Srinivasa Rao
    K.V. Madhuri
    C.V. Ramana
    B.S. Naidu
    S. Pai
    J. John
    R. Pinto
    Applied Physics A, 2002, 75 : 417 - 422
  • [46] Influence of process parameters on the growth of pulsed laser deposited thin bismuth films
    Boffoue, O
    Lenoir, B
    Hennet, L
    Maloufi, N
    Scherrer, H
    Dauscher, A
    ALT '97 INTERNATIONAL CONFERENCE ON LASER SURFACE PROCESSING, 1998, 3404 : 61 - 67
  • [47] Photostability of pulsed-laser-deposited AsxTe100-x (x=40, 50, 60) amorphous thin films
    Hawlova, Petra
    Bouska, Marek
    Nazabal, Virginie
    Baudet, Emeline
    Cernosek, Zdenek
    Nemec, Petr
    OPTICS LETTERS, 2017, 42 (09) : 1660 - 1663
  • [48] Pulsed-laser-deposited AlN films for high-temperature SiC MIS devices
    Vispute, RD
    Patel, A
    Baynes, K
    Ming, B
    Sharma, RP
    Venkatesan, T
    Scozzie, CJ
    Lelis, A
    Zheleva, T
    Jones, KA
    MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH, 2000, 5 : art. no. - W11.3
  • [49] Surface and interface study of pulsed-laser-deposited off-stoichiometric NiMnSb thin films on a Si(100) substrate
    Rai, S
    Tiwari, MK
    Lodha, GS
    Modi, MH
    Chattopadhyay, MK
    Majumdar, S
    Gardelis, S
    Viskadourakis, Z
    Giapintzakis, J
    Nandedkar, RV
    Roy, SB
    Chaddah, P
    PHYSICAL REVIEW B, 2006, 73 (03):
  • [50] Parametric dependence of the properties of pulsed-laser-deposited diamond-like carbon films
    Ong, CW
    Zhao, XA
    Cheung, JT
    Lam, SK
    Chan, PW
    Choy, CL
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1996, 63 (03): : 287 - 292