共 50 条
[44]
On the growth mechanism of pulsed-laser deposited vanadium oxide thin films
[J].
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,
2004, 111 (2-3)
:218-225
[45]
Growth and characteristics of reactive pulsed laser deposited molybdenum trioxide thin films
[J].
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,
2002, 75 (03)
:417-422
[46]
Growth and characteristics of reactive pulsed laser deposited molybdenum trioxide thin films
[J].
Applied Physics A,
2002, 75
:417-422
[47]
Influence of process parameters on the growth of pulsed laser deposited thin bismuth films
[J].
ALT '97 INTERNATIONAL CONFERENCE ON LASER SURFACE PROCESSING,
1998, 3404
:61-67
[49]
Pulsed-laser-deposited AlN films for high-temperature SiC MIS devices
[J].
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH,
2000, 5
:art. no.-W11.3
[50]
Surface and interface study of pulsed-laser-deposited off-stoichiometric NiMnSb thin films on a Si(100) substrate
[J].
PHYSICAL REVIEW B,
2006, 73 (03)