共 50 条
- [1] NEW ETCHING SYSTEM WITH A LARGE DIAMETER USING ELECTRON-BEAM EXCITED PLASMA JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1992, 31 (12B): : 4357 - 4362
- [2] LARGE RADIUS NEW ETCHING SYSTEM USING ELECTRON-BEAM EXCITED PLASMA JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2699 - 2702
- [3] LAYER-BY-LAYER CONTROLLED DIGITAL ETCHING BY MEANS OF AN ELECTRON-BEAM-EXCITED PLASMA SYSTEM JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (10): : 2216 - 2219
- [5] HIGH-RATE ION ETCHING OF GAAS AND SI AT LOW ION ENERGY BY USING AN ELECTRON-BEAM EXCITED PLASMA SYSTEM JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 1626 - 1631
- [7] Silicon-oxide etching process employing an electron-beam-excited plasma JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (02): : 543 - 547
- [8] SYSTEM FOR SHAPING LARGE-DIAMETER ANNULAR ELECTRON-BEAM SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1991, 58 (02): : 64 - 66