PRACTICAL INTEGRATION OF PROCESS, DEVICE, AND CIRCUIT SIMULATION.

被引：0

作者：

Sokel, Ralph J. ^{[1
]}

MacMillen, Donald B. ^{[1
]}

机构：

[1] INMOS Corp, Colorado Springs, CO,, USA, INMOS Corp, Colorado Springs, CO, USA

来源：

| 1600年 / CAD-4期

关键词：

IMPURITY CONCENTRATION PROFILES - INTEGRATION OF SIMULATION PROGRAMS - PROCESS SIMULATION GRIDS - PRODUCT DEVELOPMENT;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

共 50 条

[1] PRACTICAL INTEGRATION OF PROCESS, DEVICE, AND CIRCUIT SIMULATION
SOKEL, RJ
MACMILLEN, DB
IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, 1985, 4 (04) : 554 - 560
[2] PRACTICAL INTEGRATION OF PROCESS, DEVICE, AND CIRCUIT SIMULATION
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IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (10) : 2110 - 2116
[3] A TOOL TOWARDS INTEGRATION OF IC PROCESS, DEVICE, AND CIRCUIT SIMULATION
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[4] SILICON INTEGRATED CIRCUIT FABRICATION PROCESS MODELLING AND SIMULATION.
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[5] COMPUTER CIRCUIT SIMULATION.
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[6] ON MODELING THE INTRINSIC NUMBER AND FERMI LEVELS FOR DEVICE AND PROCESS SIMULATION.
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[7] INTEGRATED CIRCUIT AND NEURON SIMULATION.
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[8] Power semiconductor device models for use in discrete and power IC circuit simulation.
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[9] PROBABILITY INTEGRATION BY DIRECTIONAL SIMULATION.
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[10] PARALLEL PROCESSORS TAKE ON CIRCUIT SIMULATION.
Waterman, Pamela J.
Electronic Systems Technology and Design/Computer Design's, 1987, 26 (21):

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