Langmuir probe plasma diagnostics during TiNx deposition

被引：0
|
作者：
Lunk, A. [1 ]
Basner, R. [1 ]
机构：
[1] Univ of Greifswald, Greifswald, Germany
来源：
Materials Science and Engineering A | 1991年 / A139卷 / 1-2期
关键词：
Cathodes - Coating Techniques--Chemical Vapor Deposition - Nitrides - Titanium Compounds;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The plasma parameters in a hollow-cathode arc evaporating device were measured with a movable Langmuir probe during deposition of hard TiNx films. The following parameters are presented and discussed: ion density, plasma potential, electric field strength, electron energy distribution function and electron temperatures.
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页码：41 / 44
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