POLY(N-BUTYL alpha -CYANOACRYLATE): A HIGHLY SENSITIVE AND HIGH CONTRAST RESIST FOR ELECTRON-BEAM AND X-RAY LITHOGRAPHY.

被引：0
|
作者：
Eranian, Armand [1 ]
Datamanti, Evelyne [1 ]
Dubois, Jean-Claude [1 ]
Serre, Brigitte [1 ]
Schue, Francois [1 ]
Montginoul, Claude [1 ]
Giral, Louis [1 ]
机构：
[1] Thomson-CSF, Orsay, Fr, Thomson-CSF, Orsay, Fr
来源：
British Polymer Journal | 1987年 / 19卷 / 3-4期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：353 / 359
相关论文
共 50 条
  • [21] High resolution x-ray mask fabrication by a 100 keV electron-beam lithography system
    Wang, L
    Desta, YM
    Fettig, RK
    Goettert, J
    Hein, H
    Jakobs, P
    Schulz, J
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2004, 14 (05) : 722 - 726
  • [22] HIGH-RESOLUTION X-RAY ZONE PLATE FABRICATION USING ELECTRON-BEAM LITHOGRAPHY
    VLADIMIRSKY, Y
    ATTWOOD, D
    KERN, D
    CHANG, THP
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1986, 3 (13): : P22 - P22
  • [23] Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks
    Tu, Min
    Xia, Benzheng
    Kravchenko, Dmitry E.
    Tietze, Max Lutz
    Cruz, Alexander John
    Stassen, Ivo
    Hauffman, Tom
    Teyssandier, Joan
    De Feyter, Steven
    Wang, Zheng
    Fischer, Roland A.
    Marmiroli, Benedetta
    Amenitsch, Heinz
    Torvisco, Ana
    Velasquez-Hernandez, Miriam de J.
    Falcaro, Paolo
    Ameloot, Rob
    NATURE MATERIALS, 2021, 20 (01) : 93 - 99
  • [24] Study of x-ray lithography mask distortion during electron-beam writing
    Shang Hongyan
    Wang Yongkun
    SEVENTH INTERNATIONAL SYMPOSIUM ON INSTRUMENTATION AND CONTROL TECHNOLOGY: OPTOELECTRONIC TECHNOLOGY AND INSTUMENTS, CONTROL THEORY AND AUTOMATION, AND SPACE EXPLORATION, 2008, 7129
  • [25] IMAGING ZONE PLATES FOR X-RAY MICROSCOPY FABRICATED BY ELECTRON-BEAM LITHOGRAPHY
    UNGER, P
    BOGLI, V
    BENEKING, H
    NIEMANN, B
    GUTTMANN, P
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 323 - 327
  • [26] Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks
    Min Tu
    Benzheng Xia
    Dmitry E. Kravchenko
    Max Lutz Tietze
    Alexander John Cruz
    Ivo Stassen
    Tom Hauffman
    Joan Teyssandier
    Steven De Feyter
    Zheng Wang
    Roland A. Fischer
    Benedetta Marmiroli
    Heinz Amenitsch
    Ana Torvisco
    Miriam de J. Velásquez-Hernández
    Paolo Falcaro
    Rob Ameloot
    Nature Materials, 2021, 20 : 93 - 99
  • [27] NEW HIGH-RESOLUTION CHARGE-TRANSFER X-RAY AND ELECTRON-BEAM NEGATIVE RESIST
    HOFER, DC
    KAUFMAN, FB
    KRAMER, SR
    AVIRAM, A
    APPLIED PHYSICS LETTERS, 1980, 37 (03) : 314 - 316
  • [28] ELECTRON-BEAM AND X-RAY LITHOGRAPHY FOR VERY LARGE-SCALE INTEGRATION DEVICES
    HAYASHI, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C151 - C151
  • [29] X-ray and electron-beam lithography of three-dimensional array structures for photonics
    Romanato, F
    Cojoc, D
    Di Fabrizio, E
    Galli, M
    Bajoni, D
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 2912 - 2917
  • [30] Fabrication of X-ray masks using the silicon direct write electron-beam lithography process and complementary electron-sensitive resists
    Lavallée, E
    Beauvais, J
    Drouin, D
    Cloutier, M
    Yang, P
    Awad, Y
    Turcotte, D
    Lafrance, P
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6B): : 4122 - 4126
12345