POLY(N-BUTYL alpha -CYANOACRYLATE): A HIGHLY SENSITIVE AND HIGH CONTRAST RESIST FOR ELECTRON-BEAM AND X-RAY LITHOGRAPHY.

被引：0
|
作者：
Eranian, Armand [1 ]
Datamanti, Evelyne [1 ]
Dubois, Jean-Claude [1 ]
Serre, Brigitte [1 ]
Schue, Francois [1 ]
Montginoul, Claude [1 ]
Giral, Louis [1 ]
机构：
[1] Thomson-CSF, Orsay, Fr, Thomson-CSF, Orsay, Fr
来源：
British Polymer Journal | 1987年 / 19卷 / 3-4期
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页码：353 / 359
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