Effect of low energy oxygen ion beam on optical and electrical characteristics of dual ion beam sputtered SnO2 thin films

被引：5
|
作者：
Chung, Jae-Ho [1 ]
Choe, Yong-Sahm [1 ]
Kim, Dae-Seung [1 ]
机构：
[1] Materials Research Laboratory, TYM Research and Development Center, Tongyang Moolsan Co. Ltd, 378-1 Maeng-Ri, Yongin-Si, Kyeongki-Do, 449-870, Korea, Republic of
来源：
Thin Solid Films | 1999年 / 349卷 / 01期
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页码：126 / 129
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