EFFECT OF OXYGEN ON CHROMIUM-STRUCTURAL DEFECTS INTERACTIONIN ION-IMPLANTED GALLIUM ARSENIDE.

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作者：
SADANA, D.K.
WASHBURN, J.
ZEE, T.
WILSON, R.G.
机构：
[1] University of California, Lawrence Berkeley Laboratory, Materials and Molecular Research Division, Berkeley, CA 94720, United States
[2] Hughes Research Laboratories, Malibu, CA 90265, United States
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| 1600年 / V 53期
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