Recent developments in equipment and application of ion beam assisted thin film deposition

被引：0
|
作者：
Ensinger, W. [1 ]
Enders, B. [1 ]
Emmerich, R. [1 ]
机构：
[1] Univ of Heidelberg, Heidelberg, Germany
来源：
Materials and Manufacturing Processes | 1994年 / 9卷 / 03期
关键词：
ALLIGATOR device - Coated cardiovascular stents - Ion beam assisted thin film deposition - Ion energies;
D O I：
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学科分类号：
摘要：
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页码：519 / 535
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