Anisotropic etching of a Novalak-based polymer at cryogenic temperature

被引：0
|
作者：
IBM Almaden Research Cent, San Jose, United States [1 ]
机构：
来源：
J Electrochem Soc | / 3卷 / 1008-1013期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Anisotropic etching of a novalak-based polymer at cryogenic temperature
    Hsiao, R
    Yu, K
    Fan, LS
    Pandhumsopom, T
    Sanitini, H
    Macdonald, SA
    Robertson, N
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (03) : 1008 - 1013
  • [2] Cryogenic etching of polymer in RFI oxygen plasma
    Hsiao, R
    Yu, K
    Fan, LS
    Pandhumsopom, T
    Santini, H
    Robertson, N
    PROCEEDINGS OF THE ELEVENTH INTERNATIONAL SYMPOSIUM ON PLASMA PROCESSING, 1996, 96 (12): : 545 - 554
  • [3] ANISOTROPIC POLYSILICON ETCHING WITHOUT HYDROCARBON POLYMER FORMATION
    KELLEHER, PJ
    KAMMERDINER, L
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (11) : C447 - C447
  • [4] Stress-induced anisotropic etching in polymer track detectors
    J. Stefan Inst, Ljubljana, Slovenia
    Nucl Instrum Methods Phys Res Sect B, 3 (397-400):
  • [5] Stress-induced anisotropic etching in polymer track detectors
    Skvarc, J
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 129 (03): : 397 - 400
  • [6] On the low temperature limits for cryogenic etching: A quasi in situ XPS study
    Cemin, Felipe
    Girard, Aurelie
    Cardinaud, Christophe
    APPLIED SURFACE SCIENCE, 2023, 637
  • [7] Inductively coupled plasma etching of HgCdTe IRFPAs detectors at cryogenic temperature
    Chen, Y. Y.
    Ye, Z. H.
    Sun, C. H.
    Zhang, S.
    Hu, X. N.
    Ding, R. J.
    He, L.
    INFRARED TECHNOLOGY AND APPLICATIONS XLII, 2016, 9819
  • [8] Technology and realization of metallic curved waveguide mirrors in polymer film waveguides based on anisotropic plasma etching
    Wolff, S
    Grosse, A
    Schimper, HJ
    Giehl, AR
    Kuhnke, M
    Grote, R
    Fouckhardt, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (01): : 87 - 89
  • [9] Macroporous silicon-based deep anisotropic etching
    Tao, Y
    Esashi, M
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2005, 15 (04) : 764 - 770
  • [10] Characterization of anisotropic etching effects of KOH concentration and temperature on etching profiles properties of silicon corrugated diaphragm
    Soin, Norhayati
    Majlis, Burhanuddin Y.
    SOLID STATE SCIENCE AND TECHNOLOGY, 2007, 909 : 128 - +
12345