ION BEAM INDUCED EPITAXIAL CRYSTALLISATION OF SILICON.

被引：0

作者：

Elliman, R.G. ^{[1
]}

Johnson, S.T. ^{[1
]}

Pogany, A.P. ^{[1
]}

Williams, J.S. ^{[1
]}

机构：

[1] CSIRO, Div of Chemical Physics,, Clayton, Aust, CSIRO, Div of Chemical Physics, Clayton, Aust

来源：

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1985年 / B7-8卷 / pt 1期

关键词：

We acknowledge the Australian Research Grants Committee and the Commonwealth Special Research Centres Scheme for financial support. In addition; R.G.E. gratefully acknowledges the support of the CSIRO Postdoctoral Fellowship Scheme;

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页码：310 / 315