R.F. magnetron sputtered WTi and WTi-N thin films as diffusion barriers between Cu and Si.

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Laboratoire des Plasmas et des Couches Minces, IMN, 2 rue de la Houssinière, 44322 Nantes Cedex 3, France [1 ]
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Vide: Science, Technique et Applications | 1997年 / 53卷 / 283 SUPPL.期
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页码：122 / 123
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