Evaluation of parameters in atmospheric-pressure chemical vapor deposition of borophosphosilicate glass using tetraethylorthosilicate and ozone

被引：0

作者：

Nishimoto, Y. ^{[1
]}

Tokumasu, N. ^{[1
]}

Maeda, K. ^{[1
]}

机构：

[1] Semiconductor Process Lab. Co., Ltd., 13-29 Konan 2-chome, Minato-Ku, Tokyo 108-0075, Japan

来源：

| 2001年 / Japan Society of Applied Physics卷 / 40期

关键词：

Atmospheric pressure chemical vapor deposition - Borophosphosilicate glass - Tetraethylorthosilicate - Thermal shrinkage;

D O I：

10.1143/jjap.40.l1078

中图分类号：

学科分类号：

摘要：

引用

共 50 条

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